3-DIMENSIONAL FLOW EFFECTS IN SILICON CVD IN HORIZONTAL REACTORS

被引：169

作者：

MOFFAT, HK

JENSEN, KF

机构：

[1] Univ of Minnesota, Minneapolis, MN,, USA, Univ of Minnesota, Minneapolis, MN, USA

来源：

关键词：

D O I：

10.1149/1.2095638

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：459 / 471

页数：13

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