Laser-induced vacuum arc (Laser Arc) and its application for deposition of hard amorphous carbon films

The laser-induced vacuum arc ( Laser Arc) is a pulsed arc plasma source for thin film deposition, using a pulse laser for arc ignition on the cathode with a high repetition rate, for moving the spot over the cathode surface and optimizing the exploitation of the cathode material. The limitations of arc burning time and arc pulsing with a high frequency reduce the temperature loading of the cathode, the possibility of melting and finally the emission of microparticles. Using a graphitic carbon cathode, hard amorphous carbon films of high quality and adhesion to the substrates are prepared up to a thickness of 2 mu m with a deposition rate of about 10 mu m h(-1). At deposition temperatures below 150 degrees C the carbon films are diamond like and above this temperature they tend to graphitic behaviour. The Laser Arc process is favourable for temperature-sensitive materials.