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EFFECTS OF A THIN SIO2 LAYER ON THE FORMATION OF METAL-SILICON CONTACTS
被引:45
|
作者
:
GOODNICK, SM
论文数:
0
引用数:
0
h-index:
0
GOODNICK, SM
FATHIPOUR, M
论文数:
0
引用数:
0
h-index:
0
FATHIPOUR, M
ELLSWORTH, DL
论文数:
0
引用数:
0
h-index:
0
ELLSWORTH, DL
WILMSEN, CW
论文数:
0
引用数:
0
h-index:
0
WILMSEN, CW
机构
:
来源
:
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY
|
1981年
/ 18卷
/ 03期
关键词
:
D O I
:
10.1116/1.570962
中图分类号
:
O59 [应用物理学];
学科分类号
:
摘要
:
引用
收藏
页码:949 / 954
页数:6
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