A NEW TECHNIQUE FOR OBSERVING THE AMORPHOUS TO CRYSTALLINE TRANSFORMATION IN THIN SURFACE-LAYERS ON SILICON-WAFERS

被引：49

作者：

DROSD, B ^{[1
]}

WASHBURN, J ^{[1
]}

机构：

[1] UNIV CALIF BERKELEY,DEPT FINE ARTS,BERKELEY,CA 94720

来源：

JOURNAL OF APPLIED PHYSICS | 1980年 / 51卷 / 08期

关键词：

D O I：

10.1063/1.328220

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：4106 / 4110

页数：5

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