REACTIVE MAGNETRON SPUTTERED ZIRCONIUM-OXIDE AND ZIRCONIUM SILICON-OXIDE THIN-FILMS

被引：68
作者：
RUSSAK, MA [1 ]
JAHNES, CV [1 ]
KATZ, EP [1 ]
机构：
[1] IBM CORP,DIV GEN TECHNOL,E FISHKILL,NY 12533
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1989年 / 7卷 / 03期
关键词：
D O I：
10.1116/1.576263
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
引用
收藏
页码：1248 / 1253
页数：6
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