PROXIMITY EFFECT CORRECTIONS IN ELECTRON-BEAM LITHOGRAPHY

被引：0
|
作者：
PARIKH, M [1 ]
机构：
[1] IBM CORP, SAN JOSE, CA 95193 USA
来源：
JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1978年 / 125卷 / 03期
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D O I：
暂无
中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
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页码：C157 / C157
页数：1
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