EFFECT OF OXIDE ADDITIVE IN SILICON-NITRIDE ON INTERFACIAL STRUCTURE AND STRENGTH OF SILICON-NITRIDE JOINTS BRAZED WITH ALUMINUM

被引：27

作者：

NING, XS ^{[1
]}

OKAMOTO, T ^{[1
]}

MIYAMOTO, Y ^{[1
]}

KOREEDA, A ^{[1
]}

SUGANUMA, K ^{[1
]}

机构：

[1] NATL DEF ACAD,YOKOSUKA,KANAGAWA 239,JAPAN

来源：

关键词：

D O I：

10.1007/BF02385639

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：2865 / 2870

页数：6

共 5 条

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BARRIE, A .

[2] X-RAY PHOTOELECTRON STUDY OF SOME SILICON-OXYGEN COMPOUNDS [J].

CARRIERE, B ;

DEVILLE, JP ;

BRION, D ;

ESCARD, J .

[3]

NING XS, 1987, PHIL MAG LETT, V55, P193

[4]

NING XS, 1989, J MATER SCI, V24

[5] SURFACE OXIDATION OF SILICON-NITRIDE FILMS [J].

RAIDER, SI ;

FLITSCH, R ;

ABOAF, JA ;

PLISKIN, WA .