DRIFT VELOCITY OF ELECTRONS IN SILICON AT HIGH ELECTRIC FIELDS FROM 4.2 DEGREES TO 300 DEGREES K

被引:23
作者
RODRIGUEZ, V
NICOLET, MA
机构
[1] California Institute of Technology, Pasadena
关键词
D O I
10.1063/1.1657427
中图分类号
O59 [应用物理学];
学科分类号
摘要
The drift velocity of electrons in silicon at high electric fields is measured in the 〈111〉 direction over the range of lattice temperatures from 4.2°to 300°K. It is established that in this range a limiting drift velocity exists. Its temperature dependence is measured. The samples used and the method of measurement are briefly described. © 1969 The American Institute of Physics.
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页码:496 / +
页数:1
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