EPITAXIAL-GROWTH OF BI-SR-CA-CU-O THIN-FILMS BY MOLECULAR-BEAM EPITAXY TECHNIQUE WITH SHUTTER CONTROL

被引：35
|
作者：
NAKAYAMA, Y
TSUKADA, I
MAEDA, A
UCHINOKURA, K
机构：
来源：
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS | 1989年 / 28卷 / 10期
关键词：
D O I：
10.1143/JJAP.28.L1809
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
收藏
页码：L1809 / L1811
页数：3
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