REACTIVE AND NONREACTIVE HIGH-RATE SPUTTER DEPOSITION OF TUNGSTEN CARBIDE

被引：42
作者：
FUCHS, K
RODHAMMER, P
BERTEL, E
NETZER, FP
GORNIK, E
机构：
[1] UNIV INNSBRUCK, INST PHYS CHEM, A-6020 INNSBRUCK, AUSTRIA
[2] UNIV INNSBRUCK, INST EXPTL PHYS, A-6020 INNSBRUCK, AUSTRIA
来源：
THIN SOLID FILMS | 1987年 / 151卷 / 03期
关键词：
Work at Metallwerk Plansee was supported by the Forschungsf6rderungsfond der Gewerblichen Wirtschaft; and Auger analyses performed at the Institut fiir Physikalische Chemie; Universit/it Innsbruck; were supported by the Fonds zur F6rderung der Wissenschaftlichen Forschung (Austria);
D O I：
10.1016/0040-6090(87)90137-4
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
15
引用
收藏
页码：383 / 395
页数：13
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