Atomic structure of the Al/Si(111) phases studied using STM and total-energy calculations

被引：4

作者：

Kotlyar, V. G. ^{[1
]}

Saranin, A. A. ^{[1
,2
]}

Zotov, A. V. ^{[1
,3
]}

Kasyanova, T. V. ^{[1
]}

Chukurov, E. N. ^{[1
]}

Pisarenko, I. V. ^{[1
]}

Lifshits, V. G. ^{[1
,2
,3
]}

机构：

[1] Russian Acad Sci, Inst Automat & Control Proc, Far Eastern Branch, 5 Radio St, Vladivostok 690041, Russia

[2] Far Eastern State Univ, Fac Phys & Engn, Vladivostok 690000, Russia

[3] Vladivostok State Univ Econ & Serv, Dept Elect, Vladivostok 690600, Russia

来源：

E-JOURNAL OF SURFACE SCIENCE AND NANOTECHNOLOGY | 2005年 / 3卷

关键词：

Silicon; Aluminum; Atomic and molecular structure; Surface topography; Scanning tunneling microscopy; Total-energy calculation; Surface Phase;

D O I：

10.1380/ejssnt.2005.55

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

The submonolayer Al/ Si(111) 7x7 system has been studied by our group using scanning tunneling microscopy and total-energy calculations. We present a review of our recent results on the formation mechanisms and structural properties of the main reconstructions developed on the Si(111) 7x7 surface upon Al adsorption, including alpha-7x7, root 3x root 3, root 7x root 7 and gamma- phase.

引用

页码：55 / 62

页数：8

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