ON THE (110) ORIENTATION AS THE PREFERRED ORIENTATION FOR THE MOLECULAR-BEAM EPITAXIAL-GROWTH OF GAAS ON GE, GAP ON SI, AND SIMILAR ZINCBLENDE-ON-DIAMOND SYSTEMS

被引:92
作者
KROEMER, H
POLASKO, KJ
WRIGHT, SC
机构
关键词
D O I
10.1063/1.91643
中图分类号
O59 [应用物理学];
学科分类号
摘要
引用
收藏
页码:763 / 765
页数:3
相关论文
共 15 条
[1]   GE-GAAS(110) INTERFACE FORMATION [J].
BAUER, RS ;
MCMENAMIN, JC .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1978, 15 (04) :1444-1449
[2]   ATOMIC GEOMETRY OF SEMICONDUCTOR SURFACES [J].
DUKE, CB .
CRC CRITICAL REVIEWS IN SOLID STATE AND MATERIALS SCIENCES, 1978, 8 (01) :69-91
[3]  
FAN JCC, 1979, APPL PHYS LETT, V35, P875, DOI 10.1063/1.90990
[7]   POLAR HETEROJUNCTION INTERFACES [J].
HARRISON, WA ;
KRAUT, EA ;
WALDROP, JR ;
GRANT, RW .
PHYSICAL REVIEW B, 1978, 18 (08) :4402-4410
[8]   SURFACE RECONSTRUCTION ON SEMICONDUCTORS [J].
HARRISON, WA .
SURFACE SCIENCE, 1976, 55 (01) :1-19
[10]  
MILLER D, COMMUNICATION