INFRARED ABSORPTION AND OXYGEN CONTENT IN SILICON AND GERMANIUM

被引：362
作者：
KAISER, W
KECK, PH
LANGE, CF
机构：
来源：
PHYSICAL REVIEW | 1956年 / 101卷 / 04期
关键词：
D O I：
10.1103/PhysRev.101.1264
中图分类号：
O4 [物理学];
学科分类号：
0702 ;
摘要：
引用
收藏
页码：1264 / 1268
页数：5
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