FABRICATION OF OPTICAL-WAVEGUIDE TAPER COUPLERS UTILIZING SIO2

被引：11
作者：
BOYD, JT
CHUANG, CM
CHEN, CL
机构：
[1] University of Cincinnati, Department of Electrical and Computer Engineering, Solid State Electronics Laboratory, Cincinnati, OH
[2] Fairchild Semiconductor Research and Development Laboratories, Palo Alto, CA
来源：
APPLIED OPTICS | 1979年 / 18卷 / 04期
关键词：
D O I：
10.1364/AO.18.000506
中图分类号：
O43 [光学];
学科分类号：
070207 ; 0803 ;
摘要：
The fabrication of optical waveguide couplers involving tapered layers of is discussed. Details of the SiO2 photolithographic fabrication processing sequence are presented. This process utilizes carefully controlled etchant undercutting and has been found to be quite reproducible. It has allowed fabrication of tapers having changes in SiO2 thickness of 1.0 μm over lengths of 55–75 μm. Results are presented which demonstrate taper transverse uniformity for distances of over 600 μm. The smoothness and gradual nature of the tapers are apparent in scanning electron microscope pictures of a taper cross section. © 1979 Optical Society of America.
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页码：506 / 509
页数：4
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