IMPLANTED NOBLE-GAS ATOMS AS DIFFUSION MARKERS IN SILICIDE FORMATION

被引：229
|
作者：
CHU, WK
LAU, SS
MAYER, JW
MULLER, H
机构：
[1] CALTECH,PASADENA,CA 91109
[2] IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598
来源：
THIN SOLID FILMS | 1975年 / 25卷 / 02期
关键词：
D O I：
10.1016/0040-6090(75)90057-7
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
引用
收藏
页码：393 / 402
页数：10
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