CHARACTERIZATION OF THERMALLY GROWN SIO2 SURFACES BY CONTACT ANGLE MEASUREMENTS

被引:35
作者
FRIESER, RG [1 ]
机构
[1] IBM CORP,SYST PROD DIV,E FISHKILL FACIL,HOPEWELL JUNCTION,NY 12533
关键词
D O I
10.1149/1.2401884
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
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页码:669 / 672
页数:4
相关论文
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