THE GROWTH OF ELECTROCHEMICAL VAPOR-DEPOSITED YSZ FILMS

Electrochemical vapor deposition is a key technology for making thin layers of yttria-stabilized zirconia for solid oxide fuel cells. No systematical comparison of the reported data on the kinetics has been made in order to explain the differences in the observed growth rates, and proposed growth mechanisms for the EVD process. This paper will present a critical evaluation of the literature data along with our own results, and will show that all experiments might well be modeled using bulk diffusion as the rate limiting step and taking into account the thermodynamic equilibrium at the metal chloride side.