THE OXIDATION OF TANTALUM AT 50-300-DEGREES-C

被引:75
作者
VERMILYEA, DA
机构
来源
ACTA METALLURGICA | 1958年 / 6卷 / 03期
关键词
D O I
10.1016/0001-6160(58)90003-8
中图分类号
TF [冶金工业];
学科分类号
0806 ;
摘要
引用
收藏
页码:166 / 171
页数:6
相关论文
共 14 条
[1]  
Cabrera N., 1949, REP PROG PHYS, V12, P308
[2]  
CABRERA N, COMMUNICATION
[3]  
DEWALD JF, 1955, T ELECTROCHEM SOC, V102, P1
[4]  
GULBRANSEN EA, 1949, T ELECTROCHEM SOC, V96, P364
[5]   LOW TEMPERATURE OXIDATION OF COPPER .2. REACTION RATE ANISOTROPY [J].
RHODIN, TN .
JOURNAL OF THE AMERICAN CHEMICAL SOCIETY, 1951, 73 (07) :3143-3146
[6]   LOW TEMPERATURE OXIDATION OF COPPER .1. PHYSICAL MECHANISM [J].
RHODIN, TN .
JOURNAL OF THE AMERICAN CHEMICAL SOCIETY, 1950, 72 (11) :5102-5106
[7]   THE EFFECT OF METAL SURFACE CONDITION ON THE ANODIC OXIDATION OF TANTALUM [J].
VERMILYEA, DA .
ACTA METALLURGICA, 1954, 2 (03) :476-481
[8]  
VERMILYEA DA, 1954, T ELECTROCHEM SOC, V101, P389
[9]  
VERMILYEA DA, 1957, T ELECTROCHEM SOC, V104, P427
[10]  
VERMILYEA DA, T ELECTROCHEM SOC