INVERSION OF N-TYPE GAAS-SURFACES USING A SILICON-SILICON DIOXIDE INSULATOR STRUCTURE

被引:9
作者
HATTANGADY, SV
FOUNTAIN, GG
VITKAVAGE, DJ
RUDDER, RA
MARKUNAS, RJ
机构
关键词
D O I
10.1149/1.2097175
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
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页码:2070 / 2073
页数:4
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共 18 条
[1]   SILICON-NITRIDE-GALLIUM-ARSENIDE MIS STRUCTURES PRODUCED BY PLASMA ENHANCED DEPOSITION [J].
BAYRAKTAROGLU, B ;
JOHNSON, RL .
JOURNAL OF APPLIED PHYSICS, 1981, 52 (05) :3515-3519
[2]   INVESTIGATION OF HETEROJUNCTIONS FOR MIS DEVICES WITH OXYGEN-DOPED ALXGA1-XAS ON N-TYPE GAAS [J].
CASEY, HC ;
CHO, AY ;
LANG, DV ;
NICOLLIAN, EH ;
FOY, PW .
JOURNAL OF APPLIED PHYSICS, 1979, 50 (05) :3484-3491
[3]   INTERFACE PROPERTIES OF PLASMA-ENHANCED CHEMICAL VAPOR-DEPOSITED SIOXNY/N-GAAS METAL-INSULATOR-SEMICONDUCTOR SYSTEM [J].
CHOU, TY ;
LIN, MS .
JOURNAL OF APPLIED PHYSICS, 1986, 59 (11) :3778-3782
[4]   GAAS MIS STRUCTURES WITH SIO2 USING A THIN SILICON INTERLAYER [J].
FOUNTAIN, GG ;
HATTANGADY, SV ;
VITKAVAGE, DJ ;
RUDDER, RA ;
MARKUNAS, RJ .
ELECTRONICS LETTERS, 1988, 24 (18) :1134-1135
[5]  
FOUNTAIN GG, 1987, 34TH NAT S AM VAC SO
[6]   PASSIVATION AND INTERFACE STATE STUDIES ON N-GAAS [J].
FRESE, KW ;
MORRISON, SR .
APPLIED SURFACE SCIENCE, 1981, 8 (03) :266-277
[7]   ANODIC OXIDE-GAAS AND INP INTERFACE FORMATION [J].
GEIB, KM ;
WILMSEN, CW .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1980, 17 (05) :952-957
[8]  
HATTANGADY SV, 1987, MATERIALS RES SOC S, V102, P319
[9]   PROPERTIES OF GAAS-AL2O3 AND INP-AL2O3 INTERFACES AND THE FABRICATION OF MIS FIELD-EFFECT TRANSISTORS [J].
KAMIMURA, K ;
SAKAI, Y .
THIN SOLID FILMS, 1979, 56 (1-2) :215-223
[10]   PLASMA ENHANCED CHEMICAL VAPOR-DEPOSITION - DIFFERENCES BETWEEN DIRECT AND REMOTE PLASMA EXCITATION [J].
LUCOVSKY, G ;
TSU, DV .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1987, 5 (04) :2231-2238