RF SPUTTERING

被引：54
作者：
JACKSON, GN
机构：
来源：
THIN SOLID FILMS | 1970年 / 5卷 / 04期
关键词：
D O I：
10.1016/0040-6090(70)90095-7
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
引用
收藏
页码：209 / &
相关论文
共 67 条
[1]   SPUTTERING OF DIELECTRICS BY HIGH-FREQUENCY FIELDS [J].
ANDERSON, GS ;
MAYER, WN ;
WEHNER, GK .
JOURNAL OF APPLIED PHYSICS, 1962, 33 (10) :2991-&
[2]   SOME EXPERIMENTAL RESULTS FROM A NONEQUILIBRIUM RF DISCHARGE [J].
BOEDEKER, LR ;
HALDEMAN, CW .
AIAA JOURNAL, 1968, 6 (03) :538-&
[3]   SUBSTRATE BOMBARDMENT DURING RF SPUTTERING [J].
BRODIE, I ;
LAMONT, LT ;
MYERS, DO .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1969, 6 (01) :124-&
[4]   LIMITS FOR THE DIFFUSION THEORY OF HIGH FREQUENCY GAS DISCHARGE BREAKDOWN [J].
BROWN, SC ;
MACDONALD, AD .
PHYSICAL REVIEW, 1949, 76 (11) :1629-1633
[5]   PLASMA SHEATH FORMATION BY RADIO-FREQUENCY FIELDS [J].
BUTLER, HS ;
KINO, GS .
PHYSICS OF FLUIDS, 1963, 6 (09) :1346-1355
[6]  
CARPENTER RB, 1967, THESIS BRIGHTON COLL
[7]  
CARTER G, 1968, ION BOMBARDMENT SOLI, P40
[8]  
CHENOT M, 1947, THESIS FS PARIS
[9]   DIELECTRIC THIN FILMS THROUGH RF SPUTTERING [J].
DAVIDSE, PD ;
MAISSEL, LI .
JOURNAL OF APPLIED PHYSICS, 1966, 37 (02) :574-&
[10]  
DAVIDSE PD, 1965, 3RD P INT C VAC TECH, P651
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