HIGHLY ISOTROPIC MAGNETORESISTANCES OF HIGH SHEET-RESISTANCE COPPER-PARTICLE FILMS

被引:8
作者
LIN, JJ [1 ]
YAMADA, R [1 ]
KOBAYASHI, S [1 ]
机构
[1] NATL TAIWAN UNIV, DEPT PHYS, TAIPEI 106, TAIWAN
关键词
MAGNETORESISTANCES; STRONG LOCALIZATION; ELECTRON CORRELATIONS; ZEEMAN EFFECTS; QUANTUM INTERFERENCE EFFECTS; COPPER PARTICLE FILMS;
D O I
10.1143/JPSJ.63.4514
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
We have measured the magnetoresistances in approximate to 30-Angstrom-thick Cu-particle films between 1.2 and 4.2 K and in magnetic fields H up to 6 T, with sheet resistances R(square) (4.2 K) of the films varying from approximate to 8 k Omega to 2 M Omega. We find that the magnetoresistances are positive, exhibiting broad maxima, at low H, while they change sign and become negative at high H (typically, around 4 T). The magnitudes of the normalized magnetoresistances, Delta R(square) (H)/R(square) (0)= [R(square) (H)-R(square) (0)]/R(square) (0), are of the order of a tenth of a percent or smaller, depending on the values of R(square). Particularly, the magnetoresistances are highly isotropic, regardless of the orientation of H being applied parallel or perpendicular to the film plane. These observations are closely connected with the fine-particle structure of our films, and can be qualitatively explained in terms of Zeeman effects in producing magnetoresistances in strongly localized, interacting electrons.
引用
收藏
页码:4514 / 4520
页数:7
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