共 16 条
- [1] Barnes S.C., 1960, ELECTROCHIM ACTA, V2, P195, DOI [10.1016/0013-4686(60)87018-1, DOI 10.1016/0013-4686(60)87018-1]
- [2] BARRETT CS, 1952, STRUCTURE METALS, P185
- [3] BASSETT GA, 1959, DISCUSSIONS FARADAY, V28, P1
- [4] CAVALLARO L, 1955, REV MET, V52, P706
- [5] THE MECHANISM OF ELECTROLYTIC METAL DEPOSITION [J]. PROCEEDINGS OF THE ROYAL SOCIETY OF LONDON SERIES A-MATHEMATICAL AND PHYSICAL SCIENCES, 1958, 248 (1254): : 394 - 403
- [6] Frank F.C., 1958, GROWTH PERFECTION CR, P6
- [7] THE DOUBLE LAYER IN ELECTROCHEMISTRY [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1960, 107 (05) : 461 - 472
- [8] Greninger AB, 1935, T AM I MIN MET ENG, V117, P61
- [9] OBSERVATIONS ON THE DEVELOPMENT OF ELECTROPLATING DEPOSIT STRUCTURES ON SINGLE CRYSTALS OF COPPER [J]. PROCEEDINGS OF THE PHYSICAL SOCIETY OF LONDON, 1959, 74 (479): : 616 - 624
- [10] Pick H. J., 1960, ELECTROCHIM ACTA, V2, P165, DOI 10.1016/0013-4686(60)87014-4