THERMALLY ASSISTED TUNNELING - CH4 DISSOCIATION ON PT(111)

被引：144

作者：

HARRIS, J ^{[1
]}

SIMON, J ^{[1
]}

LUNTZ, AC ^{[1
]}

MULLINS, CB ^{[1
]}

RETTNER, CT ^{[1
]}

机构：

[1] IBM CORP,ALMADEN RES CTR,SAN JOSE,CA 95120

来源：

PHYSICAL REVIEW LETTERS | 1991年 / 67卷 / 05期

关键词：

D O I：

10.1103/PhysRevLett.67.652

中图分类号：

O4 [物理学];

学科分类号：

0702 ;

摘要：

The mechanism for the dissociation of CH4 at metal surfaces has been and is still controversial. In large part, this is because many of the experimental data suggest a direct tunneling mechanism, which is not obviously compatible with an observed strong dependence on the surface temperature. We propose here that a new phenomenon, thermally assisted tunneling, caused by a coupling of the tunnel barrier to the lattice, resolves this controversy. Explicit calculations using a simplified model for this process agree qualitatively with a wide range of experimental data for CH4 dissociation on Pt(111).

引用

页码：652 / 655

页数：4

共 15 条

[1] WAVE PACKET STUDY OF A LINEAR COLLISION PROBLEM [J].