RE-EMISSION OF SPUTTERED SIO2 DURING GROWTH AND ITS RELATION TO FILM QUALITY

被引：52
作者：
MAISSEL, LI
JONES, RE
STANDLEY, CL
机构：
来源：
IBM JOURNAL OF RESEARCH AND DEVELOPMENT | 1970年 / 14卷 / 02期
关键词：
D O I：
10.1147/rd.142.0176
中图分类号：
TP3 [计算技术、计算机技术];
学科分类号：
0812 ;
摘要：
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页码：176 / &
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