MASS SPECTROSCOPIC IDENTIFICATION OF WAVELENGTH DEPENDENT UV LASER PHOTOABLATION FRAGMENTS FROM POLYMETHYLMETHACRYLATE

被引：67

作者：

ESTLER, RC ^{[1
]}

NOGAR, NS ^{[1
]}

机构：

[1] UNIV CALIF LOS ALAMOS NATL LAB,DIV CHEM,LOS ALAMOS,NM 87545

来源：

APPLIED PHYSICS LETTERS | 1986年 / 49卷 / 18期

关键词：

D O I：

10.1063/1.97406

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：1175 / 1177

页数：3

共 18 条

[1] DIRECT ETCHING OF POLYMERIC MATERIALS USING A XECL LASER
ANDREW, JE
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KEY, PH
[J]. APPLIED PHYSICS LETTERS, 1983, 43 (08) : 717 - 719
[2] STIMULATED RAMAN EFFECT
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[J]. AMERICAN JOURNAL OF PHYSICS, 1967, 35 (11) : 989 - +
[3] VELOCITY DISTRIBUTION OF MOLECULAR FRAGMENTS FROM POLYMETHYLMETHACRYLATE IRRADIATED WITH UV LASER-PULSES
DANIELZIK, B
FABRICIUS, N
ROWEKAMP, M
VONDERLINDE, D
[J]. APPLIED PHYSICS LETTERS, 1986, 48 (03) : 212 - 214
[4] SPECTROSCOPIC STUDIES OF ARF LASER PHOTOABLATION OF PMMA
DAVIS, GM
GOWER, MC
FOTAKIS, C
EFTHIMIOPOULOS, T
ARGYRAKIS, P
[J]. APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 1985, 36 (01): : 27 - 30
[5] PHOTOLYTIC DEGRADATION OF POLY(METHYL METHACRYLATE)
FOX, RB
ISAACS, LG
STOKES, S
[J]. JOURNAL OF POLYMER SCIENCE PART A-GENERAL PAPERS, 1963, 1 (03): : 1079 - &
[6] LASER ABLATION OF ORGANIC POLYMERS - MICROSCOPIC MODELS FOR PHOTOCHEMICAL AND THERMAL-PROCESSES
GARRISON, BJ
SRINIVASAN, R
[J]. JOURNAL OF APPLIED PHYSICS, 1985, 57 (08) : 2909 - 2914
[7] MICROSCOPIC MODEL FOR THE ABLATIVE PHOTODECOMPOSITION OF POLYMERS BY FAR-ULTRAVIOLET RADIATION (193 NM)
GARRISON, BJ
SRINIVASAN, R
[J]. APPLIED PHYSICS LETTERS, 1984, 44 (09) : 849 - 851
[8] EMISSION-SPECTRA, SURFACE QUALITY, AND MECHANISM OF EXCIMER LASER ETCHING OF POLYIMIDE FILMS
KOREN, G
YEH, JTC
[J]. APPLIED PHYSICS LETTERS, 1984, 44 (12) : 1112 - 1114
[9] SURFACE-PROPERTIES OF POLY(ETHYLENE-TEREPHTHALATE) FILMS MODIFIED BY FAR-ULTRAVIOLET RADIATION AT 193-NM (LASER) AND 185-NM (LOW INTENSITY)
LAZARE, S
SRINIVASAN, R
[J]. JOURNAL OF PHYSICAL CHEMISTRY, 1986, 90 (10) : 2124 - 2131
[10] DEEP UV LITHOGRAPHY
LIN, BJ
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1975, 12 (06): : 1317 - 1320

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