MASS SPECTROSCOPIC IDENTIFICATION OF WAVELENGTH DEPENDENT UV LASER PHOTOABLATION FRAGMENTS FROM POLYMETHYLMETHACRYLATE

被引：67

作者：

ESTLER, RC ^{[1
]}

NOGAR, NS ^{[1
]}

机构：

[1] UNIV CALIF LOS ALAMOS NATL LAB,DIV CHEM,LOS ALAMOS,NM 87545

来源：

APPLIED PHYSICS LETTERS | 1986年 / 49卷 / 18期

关键词：

D O I：

10.1063/1.97406

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：1175 / 1177

页数：3

共 18 条

[1] DIRECT ETCHING OF POLYMERIC MATERIALS USING A XECL LASER [J].

ANDREW, JE ;

DYER, PE ;

FORSTER, D ;

KEY, PH .

APPLIED PHYSICS LETTERS, 1983, 43 (08) :717-719

[2] STIMULATED RAMAN EFFECT [J].

BLOEMBERGEN, N .

AMERICAN JOURNAL OF PHYSICS, 1967, 35 (11) :989-+

[3] VELOCITY DISTRIBUTION OF MOLECULAR FRAGMENTS FROM POLYMETHYLMETHACRYLATE IRRADIATED WITH UV LASER-PULSES [J].

DANIELZIK, B ;

FABRICIUS, N ;

ROWEKAMP, M ;

VONDERLINDE, D .

APPLIED PHYSICS LETTERS, 1986, 48 (03) :212-214

[4] SPECTROSCOPIC STUDIES OF ARF LASER PHOTOABLATION OF PMMA [J].

DAVIS, GM ;

GOWER, MC ;

FOTAKIS, C ;

EFTHIMIOPOULOS, T ;

ARGYRAKIS, P .

APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 1985, 36 (01) :27-30

[5] PHOTOLYTIC DEGRADATION OF POLY(METHYL METHACRYLATE) [J].

FOX, RB ;

ISAACS, LG ;

STOKES, S .

JOURNAL OF POLYMER SCIENCE PART A-GENERAL PAPERS, 1963, 1 (03) :1079-&

[6] LASER ABLATION OF ORGANIC POLYMERS - MICROSCOPIC MODELS FOR PHOTOCHEMICAL AND THERMAL-PROCESSES [J].

GARRISON, BJ ;

SRINIVASAN, R .

JOURNAL OF APPLIED PHYSICS, 1985, 57 (08) :2909-2914

[7] MICROSCOPIC MODEL FOR THE ABLATIVE PHOTODECOMPOSITION OF POLYMERS BY FAR-ULTRAVIOLET RADIATION (193 NM) [J].

GARRISON, BJ ;

SRINIVASAN, R .

APPLIED PHYSICS LETTERS, 1984, 44 (09) :849-851

[8] EMISSION-SPECTRA, SURFACE QUALITY, AND MECHANISM OF EXCIMER LASER ETCHING OF POLYIMIDE FILMS [J].

KOREN, G ;

YEH, JTC .

APPLIED PHYSICS LETTERS, 1984, 44 (12) :1112-1114

[9] SURFACE-PROPERTIES OF POLY(ETHYLENE-TEREPHTHALATE) FILMS MODIFIED BY FAR-ULTRAVIOLET RADIATION AT 193-NM (LASER) AND 185-NM (LOW INTENSITY) [J].

LAZARE, S ;

SRINIVASAN, R .

JOURNAL OF PHYSICAL CHEMISTRY, 1986, 90 (10) :2124-2131

[10] DEEP UV LITHOGRAPHY [J].

LIN, BJ .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1975, 12 (06) :1317-1320

← 1 2 →