THE ROLE OF INTERFACE IMPURITIES IN CO/CU GIANT MAGNETORESISTANCE MULTILAYERS

被引:10
|
作者
WELLOCK, KP
HICKEY, BJ
XU, J
WALKER, MJ
WISER, N
机构
[1] UNIV LEEDS,DEPT PHYS,LEEDS LS2 9JT,W YORKSHIRE,ENGLAND
[2] BAR ILAN UNIV,DEPT PHYS,RAMAT GAN,ISRAEL
关键词
D O I
10.1016/0304-8853(94)01040-4
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
We have deposited impurities (An, Ge and Cu) at the interfaces of Co/Cu multilayers grown by MBE. It was found that small fractions of a monolayer of impurities dramatically affect the GMR.
引用
收藏
页码:585 / 586
页数:2
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