LOCAL STRESS MEASUREMENT IN THIN THERMAL SIO2 FILMS ON SI-SUBSTRATES

被引：50

作者：

LIN, SCH

PUGACZMU.I

机构：

来源：

关键词：

D O I：

10.1063/1.1660794

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：119 / &

共 10 条

[1]

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[2]

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[6]

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[8]

TIMOSHENKO S, 1955, STRENGTH MATERIALS

[9] RESIDUAL STRESSES AT AN OXIDE-SILICON INTERFACE [J].

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HAUSER, JR .