HIGH-RATE SPUTTER DEPOSITION - CIRCULAR MAGNETRONS

被引：9
作者：
FRASER, DB
机构：
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1978年 / 15卷 / 02期
关键词：
D O I：
10.1116/1.569449
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
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页码：178 / 178
页数：1
相关论文
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