THE ANNEALING OF HELIUM-INDUCED CAVITIES IN SILICON AND THE INHIBITING ROLE OF OXYGEN

被引：61

作者：

EVANS, JH ^{[1
]}

VANVEEN, A ^{[1
]}

GRIFFIOEN, CC ^{[1
]}

机构：

[1] DELFT UNIV TECHNOL,INST INTERUNIV REACTOR,NL-2629 JB DELFT,NETHERLANDS

来源：

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS | 1987年 / 28卷 / 03期

关键词：

D O I：

10.1016/0168-583X(87)90176-5

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

引用

页码：360 / 363

页数：4

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