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LATTICE STRAIN AND MISFIT DISLOCATION IN GAAS-GAALASP HETEROJUNCTION
被引:5
作者
:
NISHIZAWA, J
论文数:
0
引用数:
0
h-index:
0
NISHIZAWA, J
OKUNO, Y
论文数:
0
引用数:
0
h-index:
0
OKUNO, Y
FUKASE, M
论文数:
0
引用数:
0
h-index:
0
FUKASE, M
TADANO, H
论文数:
0
引用数:
0
h-index:
0
TADANO, H
机构
:
来源
:
JOURNAL OF CRYSTAL GROWTH
|
1981年
/ 52卷
/ APR期
关键词
:
D O I
:
10.1016/0022-0248(81)90400-0
中图分类号
:
O7 [晶体学];
学科分类号
:
0702 ;
070205 ;
0703 ;
080501 ;
摘要
:
引用
收藏
页码:929 / 935
页数:7
相关论文
共 11 条
[1]
X-RAY MEASUREMENT OF ELASTIC STRAIN AND LATTICE CONSTANT OF DIFFUSED SILICON
[J].
COHEN, BG
论文数:
0
引用数:
0
h-index:
0
COHEN, BG
.
SOLID-STATE ELECTRONICS,
1967,
10
(01)
:33
-&
[2]
LATTICE MISFIT AND ITS COMPENSATION IN SI-EPITAXIAL LAYER BY DOPING WITH GERMANIUM AND CARBON
[J].
LEE, YT
论文数:
0
引用数:
0
h-index:
0
机构:
TOHOKU UNIV,RES INST ELECT COMMUN,SENDAI,JAPAN
TOHOKU UNIV,RES INST ELECT COMMUN,SENDAI,JAPAN
LEE, YT
;
MIYAMOTO, N
论文数:
0
引用数:
0
h-index:
0
机构:
TOHOKU UNIV,RES INST ELECT COMMUN,SENDAI,JAPAN
TOHOKU UNIV,RES INST ELECT COMMUN,SENDAI,JAPAN
MIYAMOTO, N
;
NISHIZAWA, J
论文数:
0
引用数:
0
h-index:
0
机构:
TOHOKU UNIV,RES INST ELECT COMMUN,SENDAI,JAPAN
TOHOKU UNIV,RES INST ELECT COMMUN,SENDAI,JAPAN
NISHIZAWA, J
.
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1975,
122
(04)
:530
-535
[3]
NEARLY PERFECT CRYSTAL-GROWTH OF III-V COMPOUNDS BY TEMPERATURE DIFFERENCE METHOD UNDER CONTROLLED VAPOR-PRESSURE
[J].
NISHIZAWA, J
论文数:
0
引用数:
0
h-index:
0
机构:
TOHOKU UNIV,RES INST ELECT COMMUN,SENDAI,JAPAN
TOHOKU UNIV,RES INST ELECT COMMUN,SENDAI,JAPAN
NISHIZAWA, J
;
OKUNO, Y
论文数:
0
引用数:
0
h-index:
0
机构:
TOHOKU UNIV,RES INST ELECT COMMUN,SENDAI,JAPAN
TOHOKU UNIV,RES INST ELECT COMMUN,SENDAI,JAPAN
OKUNO, Y
;
TADANO, H
论文数:
0
引用数:
0
h-index:
0
机构:
TOHOKU UNIV,RES INST ELECT COMMUN,SENDAI,JAPAN
TOHOKU UNIV,RES INST ELECT COMMUN,SENDAI,JAPAN
TADANO, H
.
JOURNAL OF CRYSTAL GROWTH,
1975,
31
(DEC)
:215
-222
[4]
OBSERVATIONS OF DEFECTS IN LPE GAAS REVEALED BY NEW CHEMICAL ETCHANT
[J].
NISHIZAWA, J
论文数:
0
引用数:
0
h-index:
0
机构:
Research Institute of Electrical Communication, Tohoku University, Sendai
NISHIZAWA, J
;
OYAMA, Y
论文数:
0
引用数:
0
h-index:
0
机构:
Research Institute of Electrical Communication, Tohoku University, Sendai
OYAMA, Y
;
TADANO, H
论文数:
0
引用数:
0
h-index:
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Research Institute of Electrical Communication, Tohoku University, Sendai
TADANO, H
;
INOKUCHI, K
论文数:
0
引用数:
0
h-index:
0
机构:
Research Institute of Electrical Communication, Tohoku University, Sendai
INOKUCHI, K
;
OKUNO, Y
论文数:
0
引用数:
0
h-index:
0
机构:
Research Institute of Electrical Communication, Tohoku University, Sendai
OKUNO, Y
.
JOURNAL OF CRYSTAL GROWTH,
1979,
47
(03)
:434
-436
[5]
NISHIZAWA J, 1972, OYO BUTSURI, V41, P912
[6]
LIQUID-PHASE EPITAXY OF GAP BY A TEMPERATURE DIFFERENCE METHOD UNDER CONTROLLED VAPOR-PRESSURE
[J].
NISHIZAWA, JI
论文数:
0
引用数:
0
h-index:
0
机构:
TOHOKU UNIV,RES INST ELECT COMMUN,SENDAI,JAPAN
NISHIZAWA, JI
;
OKUNO, Y
论文数:
0
引用数:
0
h-index:
0
机构:
TOHOKU UNIV,RES INST ELECT COMMUN,SENDAI,JAPAN
OKUNO, Y
.
IEEE TRANSACTIONS ON ELECTRON DEVICES,
1975,
22
(09)
:716
-721
[7]
PERFECT CRYSTAL-GROWTH OF SILICON BY VAPOR-DEPOSITION
[J].
NISHIZAWA, JI
论文数:
0
引用数:
0
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0
机构:
TOHOKU UNIV,RES INST ELECT COMMUN,SENDAI,JAPAN
NISHIZAWA, JI
;
TERASAKI, T
论文数:
0
引用数:
0
h-index:
0
机构:
TOHOKU UNIV,RES INST ELECT COMMUN,SENDAI,JAPAN
TERASAKI, T
;
YAGI, K
论文数:
0
引用数:
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0
机构:
TOHOKU UNIV,RES INST ELECT COMMUN,SENDAI,JAPAN
YAGI, K
;
MIYAMOTO, N
论文数:
0
引用数:
0
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0
机构:
TOHOKU UNIV,RES INST ELECT COMMUN,SENDAI,JAPAN
MIYAMOTO, N
.
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1975,
122
(05)
:664
-669
[8]
INTERFACIAL LATTICE MISMATCH EFFECTS IN III-V COMPOUNDS
[J].
OLSEN, GH
论文数:
0
引用数:
0
h-index:
0
机构:
RCA LABS,PRINCETON,NJ 08540
RCA LABS,PRINCETON,NJ 08540
OLSEN, GH
.
JOURNAL OF CRYSTAL GROWTH,
1975,
31
(DEC)
:223
-239
[9]
MISFIT DISLOCATIONS IN BICRYSTALS OF EPITAXIALLY GROWN SILICON ON BORON-DOPED SILICON SUBSTRATES
[J].
SUGITA, Y
论文数:
0
引用数:
0
h-index:
0
机构:
Central Research Laboratory, Hitachi Ltd., Kokubunji, Tokyo
SUGITA, Y
;
TAMURA, M
论文数:
0
引用数:
0
h-index:
0
机构:
Central Research Laboratory, Hitachi Ltd., Kokubunji, Tokyo
TAMURA, M
;
SUGAWARA, K
论文数:
0
引用数:
0
h-index:
0
机构:
Central Research Laboratory, Hitachi Ltd., Kokubunji, Tokyo
SUGAWARA, K
.
JOURNAL OF APPLIED PHYSICS,
1969,
40
(08)
:3089
-&
[10]
ANOMALOUS DIFFUSION OF PHOSPHORUS INTO SILICON
[J].
YAGI, K
论文数:
0
引用数:
0
h-index:
0
YAGI, K
;
MIYAMOTO, N
论文数:
0
引用数:
0
h-index:
0
MIYAMOTO, N
;
NISHIZAWA, JI
论文数:
0
引用数:
0
h-index:
0
NISHIZAWA, JI
.
JAPANESE JOURNAL OF APPLIED PHYSICS,
1970,
9
(03)
:246
-+
←
1
2
→
共 11 条
[1]
X-RAY MEASUREMENT OF ELASTIC STRAIN AND LATTICE CONSTANT OF DIFFUSED SILICON
[J].
COHEN, BG
论文数:
0
引用数:
0
h-index:
0
COHEN, BG
.
SOLID-STATE ELECTRONICS,
1967,
10
(01)
:33
-&
[2]
LATTICE MISFIT AND ITS COMPENSATION IN SI-EPITAXIAL LAYER BY DOPING WITH GERMANIUM AND CARBON
[J].
LEE, YT
论文数:
0
引用数:
0
h-index:
0
机构:
TOHOKU UNIV,RES INST ELECT COMMUN,SENDAI,JAPAN
TOHOKU UNIV,RES INST ELECT COMMUN,SENDAI,JAPAN
LEE, YT
;
MIYAMOTO, N
论文数:
0
引用数:
0
h-index:
0
机构:
TOHOKU UNIV,RES INST ELECT COMMUN,SENDAI,JAPAN
TOHOKU UNIV,RES INST ELECT COMMUN,SENDAI,JAPAN
MIYAMOTO, N
;
NISHIZAWA, J
论文数:
0
引用数:
0
h-index:
0
机构:
TOHOKU UNIV,RES INST ELECT COMMUN,SENDAI,JAPAN
TOHOKU UNIV,RES INST ELECT COMMUN,SENDAI,JAPAN
NISHIZAWA, J
.
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1975,
122
(04)
:530
-535
[3]
NEARLY PERFECT CRYSTAL-GROWTH OF III-V COMPOUNDS BY TEMPERATURE DIFFERENCE METHOD UNDER CONTROLLED VAPOR-PRESSURE
[J].
NISHIZAWA, J
论文数:
0
引用数:
0
h-index:
0
机构:
TOHOKU UNIV,RES INST ELECT COMMUN,SENDAI,JAPAN
TOHOKU UNIV,RES INST ELECT COMMUN,SENDAI,JAPAN
NISHIZAWA, J
;
OKUNO, Y
论文数:
0
引用数:
0
h-index:
0
机构:
TOHOKU UNIV,RES INST ELECT COMMUN,SENDAI,JAPAN
TOHOKU UNIV,RES INST ELECT COMMUN,SENDAI,JAPAN
OKUNO, Y
;
TADANO, H
论文数:
0
引用数:
0
h-index:
0
机构:
TOHOKU UNIV,RES INST ELECT COMMUN,SENDAI,JAPAN
TOHOKU UNIV,RES INST ELECT COMMUN,SENDAI,JAPAN
TADANO, H
.
JOURNAL OF CRYSTAL GROWTH,
1975,
31
(DEC)
:215
-222
[4]
OBSERVATIONS OF DEFECTS IN LPE GAAS REVEALED BY NEW CHEMICAL ETCHANT
[J].
NISHIZAWA, J
论文数:
0
引用数:
0
h-index:
0
机构:
Research Institute of Electrical Communication, Tohoku University, Sendai
NISHIZAWA, J
;
OYAMA, Y
论文数:
0
引用数:
0
h-index:
0
机构:
Research Institute of Electrical Communication, Tohoku University, Sendai
OYAMA, Y
;
TADANO, H
论文数:
0
引用数:
0
h-index:
0
机构:
Research Institute of Electrical Communication, Tohoku University, Sendai
TADANO, H
;
INOKUCHI, K
论文数:
0
引用数:
0
h-index:
0
机构:
Research Institute of Electrical Communication, Tohoku University, Sendai
INOKUCHI, K
;
OKUNO, Y
论文数:
0
引用数:
0
h-index:
0
机构:
Research Institute of Electrical Communication, Tohoku University, Sendai
OKUNO, Y
.
JOURNAL OF CRYSTAL GROWTH,
1979,
47
(03)
:434
-436
[5]
NISHIZAWA J, 1972, OYO BUTSURI, V41, P912
[6]
LIQUID-PHASE EPITAXY OF GAP BY A TEMPERATURE DIFFERENCE METHOD UNDER CONTROLLED VAPOR-PRESSURE
[J].
NISHIZAWA, JI
论文数:
0
引用数:
0
h-index:
0
机构:
TOHOKU UNIV,RES INST ELECT COMMUN,SENDAI,JAPAN
NISHIZAWA, JI
;
OKUNO, Y
论文数:
0
引用数:
0
h-index:
0
机构:
TOHOKU UNIV,RES INST ELECT COMMUN,SENDAI,JAPAN
OKUNO, Y
.
IEEE TRANSACTIONS ON ELECTRON DEVICES,
1975,
22
(09)
:716
-721
[7]
PERFECT CRYSTAL-GROWTH OF SILICON BY VAPOR-DEPOSITION
[J].
NISHIZAWA, JI
论文数:
0
引用数:
0
h-index:
0
机构:
TOHOKU UNIV,RES INST ELECT COMMUN,SENDAI,JAPAN
NISHIZAWA, JI
;
TERASAKI, T
论文数:
0
引用数:
0
h-index:
0
机构:
TOHOKU UNIV,RES INST ELECT COMMUN,SENDAI,JAPAN
TERASAKI, T
;
YAGI, K
论文数:
0
引用数:
0
h-index:
0
机构:
TOHOKU UNIV,RES INST ELECT COMMUN,SENDAI,JAPAN
YAGI, K
;
MIYAMOTO, N
论文数:
0
引用数:
0
h-index:
0
机构:
TOHOKU UNIV,RES INST ELECT COMMUN,SENDAI,JAPAN
MIYAMOTO, N
.
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1975,
122
(05)
:664
-669
[8]
INTERFACIAL LATTICE MISMATCH EFFECTS IN III-V COMPOUNDS
[J].
OLSEN, GH
论文数:
0
引用数:
0
h-index:
0
机构:
RCA LABS,PRINCETON,NJ 08540
RCA LABS,PRINCETON,NJ 08540
OLSEN, GH
.
JOURNAL OF CRYSTAL GROWTH,
1975,
31
(DEC)
:223
-239
[9]
MISFIT DISLOCATIONS IN BICRYSTALS OF EPITAXIALLY GROWN SILICON ON BORON-DOPED SILICON SUBSTRATES
[J].
SUGITA, Y
论文数:
0
引用数:
0
h-index:
0
机构:
Central Research Laboratory, Hitachi Ltd., Kokubunji, Tokyo
SUGITA, Y
;
TAMURA, M
论文数:
0
引用数:
0
h-index:
0
机构:
Central Research Laboratory, Hitachi Ltd., Kokubunji, Tokyo
TAMURA, M
;
SUGAWARA, K
论文数:
0
引用数:
0
h-index:
0
机构:
Central Research Laboratory, Hitachi Ltd., Kokubunji, Tokyo
SUGAWARA, K
.
JOURNAL OF APPLIED PHYSICS,
1969,
40
(08)
:3089
-&
[10]
ANOMALOUS DIFFUSION OF PHOSPHORUS INTO SILICON
[J].
YAGI, K
论文数:
0
引用数:
0
h-index:
0
YAGI, K
;
MIYAMOTO, N
论文数:
0
引用数:
0
h-index:
0
MIYAMOTO, N
;
NISHIZAWA, JI
论文数:
0
引用数:
0
h-index:
0
NISHIZAWA, JI
.
JAPANESE JOURNAL OF APPLIED PHYSICS,
1970,
9
(03)
:246
-+
←
1
2
→