LATTICE STRAIN AND MISFIT DISLOCATION IN GAAS-GAALASP HETEROJUNCTION

被引:5
作者
NISHIZAWA, J
OKUNO, Y
FUKASE, M
TADANO, H
机构
关键词
D O I
10.1016/0022-0248(81)90400-0
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
引用
收藏
页码:929 / 935
页数:7
相关论文
共 11 条
[2]   LATTICE MISFIT AND ITS COMPENSATION IN SI-EPITAXIAL LAYER BY DOPING WITH GERMANIUM AND CARBON [J].
LEE, YT ;
MIYAMOTO, N ;
NISHIZAWA, J .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1975, 122 (04) :530-535
[3]   NEARLY PERFECT CRYSTAL-GROWTH OF III-V COMPOUNDS BY TEMPERATURE DIFFERENCE METHOD UNDER CONTROLLED VAPOR-PRESSURE [J].
NISHIZAWA, J ;
OKUNO, Y ;
TADANO, H .
JOURNAL OF CRYSTAL GROWTH, 1975, 31 (DEC) :215-222
[4]   OBSERVATIONS OF DEFECTS IN LPE GAAS REVEALED BY NEW CHEMICAL ETCHANT [J].
NISHIZAWA, J ;
OYAMA, Y ;
TADANO, H ;
INOKUCHI, K ;
OKUNO, Y .
JOURNAL OF CRYSTAL GROWTH, 1979, 47 (03) :434-436
[5]  
NISHIZAWA J, 1972, OYO BUTSURI, V41, P912
[6]   LIQUID-PHASE EPITAXY OF GAP BY A TEMPERATURE DIFFERENCE METHOD UNDER CONTROLLED VAPOR-PRESSURE [J].
NISHIZAWA, JI ;
OKUNO, Y .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1975, 22 (09) :716-721
[7]   PERFECT CRYSTAL-GROWTH OF SILICON BY VAPOR-DEPOSITION [J].
NISHIZAWA, JI ;
TERASAKI, T ;
YAGI, K ;
MIYAMOTO, N .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1975, 122 (05) :664-669
[8]   INTERFACIAL LATTICE MISMATCH EFFECTS IN III-V COMPOUNDS [J].
OLSEN, GH .
JOURNAL OF CRYSTAL GROWTH, 1975, 31 (DEC) :223-239
[9]   MISFIT DISLOCATIONS IN BICRYSTALS OF EPITAXIALLY GROWN SILICON ON BORON-DOPED SILICON SUBSTRATES [J].
SUGITA, Y ;
TAMURA, M ;
SUGAWARA, K .
JOURNAL OF APPLIED PHYSICS, 1969, 40 (08) :3089-&
[10]   ANOMALOUS DIFFUSION OF PHOSPHORUS INTO SILICON [J].
YAGI, K ;
MIYAMOTO, N ;
NISHIZAWA, JI .
JAPANESE JOURNAL OF APPLIED PHYSICS, 1970, 9 (03) :246-+