DETERMINATION OF PLASMA GAS TEMPERATURE DURING REACTIVE SPUTTER ETCHING

被引：19
作者：
OSHIMA, M
机构：
来源：
JAPANESE JOURNAL OF APPLIED PHYSICS | 1978年 / 17卷 / 06期
关键词：
D O I：
10.1143/JJAP.17.1157
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
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页码：1157 / 1158
页数：2
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