DYNAMICS AND MORPHOLOGY OF BRITTLE CRACKS - A MOLECULAR-DYNAMICS STUDY OF SILICON-NITRIDE

被引：111

作者：

NAKANO, A

KALIA, RK

VASHISHTA, P

机构：

[1] Concurrent Computing Laboratory for Materials Simulations, Department of Computer Science, Louisiana State University, Baton Rouge

来源：

PHYSICAL REVIEW LETTERS | 1995年 / 75卷 / 17期

关键词：

D O I：

10.1103/PhysRevLett.75.3138

中图分类号：

O4 [物理学];

学科分类号：

0702 ;

摘要：

Crack propagation in amorphous Si3N4 films is investigated with large-scale molecular-dynamics simulations on parallel machines. We observe a correlation between the speed of crack propagation and the morphology of fracture surfaces. Initially, as the crack propagates slowly, the roughness exponent for fracture surfaces is found to be 0.44. However, beyond a certain speed of crack propagation, the exponent crosses over to 0.8. This crossover behavior is similar to the recent experimental finding by Bouchaud and Naveos.

引用

页码：3138 / 3141

页数：4

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