DIFFUSION OF SILICON IN ALUMINUM

被引：171
作者：
FUJIKAWA, SI [1 ]
HIRANO, KI [1 ]
FUKUSHIMA, Y [1 ]
机构：
[1] TYOTA CENT LAB,NAGOYA 468,JAPAN
来源：
METALLURGICAL TRANSACTIONS A-PHYSICAL METALLURGY AND MATERIALS SCIENCE | 1978年 / 9卷 / 12期
关键词：
D O I：
10.1007/BF02663412
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
引用
收藏
页码：1811 / 1815
页数：5
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