KINETICS OF MORPHOLOGICAL CHANGE DURING ANNEALING OF AMORPHOUS YTTRIA

被引:3
作者
MUKHERJEE, SN
AITA, CR
机构
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A | 1992年 / 10卷 / 05期
关键词
D O I
10.1116/1.577825
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
We report a time-at-temperature study of air annealing at 700-degrees-C of amorphous yttria films sputter deposited on fused silica. The results show that crystallization was limited (7%). A striking morphological change involved the formation of 2.5-mu-m-maximum diameter globules. By comparing changes in globule number with maximum diameter, the time-at-temperature ranges for which nucleation + growth and growth + coarsening processes occurred was determined. The globule formation rate initially followed an Arrhenius curve: dN(V)/dt = (4 X 10(5)/cc s)exp[ - 0.28 x 10(-3)/s)t]. The activation energy estimated for globule formation was close to that for Y diffusion in yttria.
引用
收藏
页码:3356 / 3358
页数:3
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