CORRELATION BETWEEN TARGET-SUBSTRATE DISTANCE AND OXYGEN-PRESSURE IN PULSED LASER DEPOSITION OF YBA2CU3O7

被引：84

作者：

KIM, HS ^{[1
]}

KWOK, HS ^{[1
]}

机构：

[1] SUNY BUFFALO,DEPT ELECT ENGN,BUFFALO,NY 14260

来源：

APPLIED PHYSICS LETTERS | 1992年 / 61卷 / 18期

关键词：

D O I：

10.1063/1.108278

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

It is shown that in pulsed laser deposition, there exists an optimal target-substrate distance for each deposition 02 pressure necessary for the growth of high quality superconducting films. This result indicates that plasma dynamics plays an important role in forming the superconducting films. A scaling law of PD2=constant is obtained for the optimized conditions.

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页码：2234 / 2236

页数：3

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