PROPOSED MODEL FOR COMPOSITION OF SPUTTERED MULTICOMPONENT THIN FILMS

被引：63

作者：

WINTERS, HF

RAIMONDI, DL

HORNE, DE

机构：

[1] IBM San Jose Research Laboratory, San Jose

来源：

JOURNAL OF APPLIED PHYSICS | 1969年 / 40卷 / 07期

关键词：

D O I：

10.1063/1.1658113

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

A simple model is proposed which predicts the composition of sputtered multicomponent thin films. The model is applied to such problems as alloy sputtering, gas incorporation into thin films, and compound formation. Several practical systems are considered such as the sputtering of Gd3Fe 5 and Ni4Fe alloys and the incorporation of argon, oxygen, and nitrogen into tungsten films. The results of these studies suggest that the film composition is a strong function of vapor pressure, sputtering rate, atomic size, system geometry, sticking probabilities, and sputtering coefficients. © 1969 The American Institute of Physics.

引用

页码：2996 / &

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