ANALYTICAL ELECTRON-MICROSCOPY OF THIN SEGREGATED LAYERS

被引：24

作者：

FAULKNER, RG ^{[1
]}

MORGAN, TS ^{[1
]}

LITTLE, EA ^{[1
]}

机构：

[1] HARWELL LAB,DEPT MAT PERFORMANCE,DIDCOT OX11 0RA,OXON,ENGLAND

来源：

X-RAY SPECTROMETRY | 1994年 / 23卷 / 05期

关键词：

D O I：

10.1002/xrs.1300230503

中图分类号：

O433 [光谱学];

学科分类号：

0703 ; 070302 ;

摘要：

Analytical convolution methods used to explain the interaction of a fine electron beam with a thin segregated layer in a typical electron microscope specimen are described. Expressions are derived which quantify the shape of the measured concentration profile determined in the microscope by scanning the beam across the segregated layer. The expression contains parameters concerned with the beam profile and the thickness of the segregated layer. The method is applied to grain boundary segregation studies of neutron-irradiated ferritic-martensitic steels.

引用

页码：195 / 202

页数：8

共 11 条

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