THE VAPOR-PHASE DEPOSITION OF REFRACTORY MATERIALS .1. GENERAL CONDITIONS AND APPARATUS

被引:101
作者
CAMPBELL, IE
POWELL, CF
NOWICKI, DH
GONSER, BW
机构
关键词
D O I
10.1149/1.2776795
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
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页码:318 / 333
页数:16
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共 4 条
[1]   A method for the purification of the elements with a high melting point carbide, nitride and boride as well as description of some of their characteristics [J].
Agte, C ;
Moers, K .
ZEITSCHRIFT FUR ANORGANISCHE UND ALLGEMEINE CHEMIE, 1931, 198 (03) :233-275
[2]  
MAXWELL CR, 1943, PB49564
[3]   THE DEPOSITION OF TANTALUM AND COLUMBIUM FROM THEIR VOLATILIZED HALIDES [J].
POWELL, CF ;
CAMPBELL, IE ;
GONSER, BW .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1948, 93 (06) :258-265
[4]  
VANARKEL AE, 1943, REINE METALLE, P34