Behavior of constant plasma potential in low-pressure UF discharge

被引：0

作者：

Lisovskii, VA

Krasnikov, OV

机构：

来源：

PISMA V ZHURNAL TEKHNICHESKOI FIZIKI | 1995年 / 21卷 / 22期

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D O I：

暂无

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：57 / 61

页数：5

共 17 条

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