MULTIPLE-SCATTERING AND PLANAR DECHANNELING IN SILICON AND GERMANIUM

被引：47
作者：
FELDMAN, LC
APPLETON, BR
机构：
[1] BELL TEL LABS INC,MURRAY HILL,NJ 07974
[2] OAK RIDGE NATL LAB,OAK RIDGE,TN 37830
来源：
PHYSICAL REVIEW B | 1973年 / 8卷 / 03期
关键词：
D O I：
10.1103/PhysRevB.8.935
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
引用
收藏
页码：935 / 951
页数：17
相关论文
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