The Effect of Laser Annealing on the Surface Morphology and Optical Characteristics of Nanosilicon Films

被引：0

作者：

Rodionova, T. V. ^{[1
]}

Sutyagina, A. S. ^{[1
]}

Gumenyuk, A. G. ^{[1
]}

Robur, L. Y. ^{[1
]}

机构：

[1] Taras Shevchenko Natl Univ Kyiv, 64-13 Volodymyrska Str, UA-01601 Kiev, Ukraine

来源：

JOURNAL OF NANO- AND ELECTRONIC PHYSICS | 2015年 / 7卷 / 01期

关键词：

Nanocrystalline silicon films; Surface roughness; Grain growth; Laser annealing; Optical properties;

D O I：

暂无

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

The effect of laser annealing on the surface microrelief and optical properties of nanocrystalline silicon films, prepared by low pressure chemical vapor deposition, has been investigated. It is shown that under the interaction with the laser radiation recrystallization takes place in the films, due to which there is a smoothing of surface irregularities and forming of grain-agglomerates. These structural changes lead to the decrease in the content of the silicon oxide films by reducing the area of the grain boundaries. The additional peak at 480 nm is observed in the absorption spectrum of the films.

引用

页数：5

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