DIFFRACTION EFFICIENCY OF CONTINUOUSLY ETCHED GRATINGS IN AS2S3 FILMS

[1] Born M., 1975, PRINCIPLES OPTICS, P62

[2] COLLIER RL, 1971, OPTICAL HOLOGRAPHY, P107

[3] DUH K, 1973, B AM PHYS SOC, V18, P325

[4] JANAI M, 1976, PHOTOGR SCI ENG, V20, P234

[5] FE2O3 - INORGANIC ELECTRON RESIST MATERIAL [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1974, 121 (07) : 929 - 932

[6] SURFACE RELIEF HOLOGRAMS IN EVAPORATED ARSENIC TRISULFIDE FILMS [J]. THIN SOLID FILMS, 1974, 21 (02) : 281 - 285

[7] EFFICIENCY OF PHOTOCHROMIC GRATINGS [J]. JOURNAL OF THE OPTICAL SOCIETY OF AMERICA, 1971, 61 (09) : 1202 - &

[8] Kogelnik H., 1967, Proceedings of the symposium on modern optics, P605

[9] NEW APPLICATION OF SE-GE GLASSES TO SILICON MICROFABRICATION TECHNOLOGY [J]. APPLIED PHYSICS LETTERS, 1976, 28 (03) : 145 - 147

[10] IRON-OXIDE - INORGANIC PHOTORESIST AND MASK MATERIAL [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1974, 121 (07) : 925 - 928

[1] Born M., 1975, PRINCIPLES OPTICS, P62

[2] COLLIER RL, 1971, OPTICAL HOLOGRAPHY, P107

[3] DUH K, 1973, B AM PHYS SOC, V18, P325

[4] JANAI M, 1976, PHOTOGR SCI ENG, V20, P234

[5] FE2O3 - INORGANIC ELECTRON RESIST MATERIAL [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1974, 121 (07) : 929 - 932

[6] SURFACE RELIEF HOLOGRAMS IN EVAPORATED ARSENIC TRISULFIDE FILMS [J]. THIN SOLID FILMS, 1974, 21 (02) : 281 - 285

[7] EFFICIENCY OF PHOTOCHROMIC GRATINGS [J]. JOURNAL OF THE OPTICAL SOCIETY OF AMERICA, 1971, 61 (09) : 1202 - &

[8] Kogelnik H., 1967, Proceedings of the symposium on modern optics, P605

[9] NEW APPLICATION OF SE-GE GLASSES TO SILICON MICROFABRICATION TECHNOLOGY [J]. APPLIED PHYSICS LETTERS, 1976, 28 (03) : 145 - 147

[10] IRON-OXIDE - INORGANIC PHOTORESIST AND MASK MATERIAL [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1974, 121 (07) : 925 - 928