POLY(TRIFLUOROETHYL ALPHA-CHLOROACRYLATE AS A HIGHLY SENSITIVE POSITIVE ELECTRON RESIST

被引：40
作者：
TADA, T
机构：
[1] VLSI Technology Research Association, Cooperative Laboratories, Takatsu, Kawasaki
来源：
JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1979年 / 126卷 / 10期
关键词：
electron beam; Integrated circuits; molecular orbital;
D O I：
10.1149/1.2128809
中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
[No abstract available]
引用
收藏
页码：1829 / 1830
页数：2
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