EFFECT OF OXYGEN ON THE ELECTRICAL CHARACTERISTICS OF FIELD-EFFECT TRANSISTORS FORMED FROM ELECTROCHEMICALLY DEPOSITED FILMS OF POLY(3-METHYLTHIOPHENE)

Field effect devices have been formed in which the active layer is a thin film of poly(3-methylthiophene) grown electrochemically onto preformed source and drain electrodes. Although a field effect is present after electrochemical undoping, stable device characteristics with a high modulation ratio are obtained only after vacuum annealing at an elevated temperature, and only then if the devices are held in vacuo. The polymer is shown to be p type and the devices operate in accumulation only. The hole mobility in devices thermally annealed under vacuum is around 10(-3) cm2 V-1 s-1. On exposure to ambient laboratory air, the device conductance increases by several orders of magnitude. This increase may be reversed by subjecting the device to a further high-temperature anneal under vacuum. Subsidiary experiments show that these effects are caused by the reversible doping of the polymer by gaseous oxygen.