DIELECTRIC-BREAKDOWN IN ELECTRICALLY STRESSED THIN-FILMS OF THERMAL SIO2

被引：338
作者：
HARARI, E
机构：
来源：
JOURNAL OF APPLIED PHYSICS | 1978年 / 49卷 / 04期
关键词：
D O I：
10.1063/1.325096
中图分类号：
O59 [应用物理学];
学科分类号：
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页码：2478 / 2489
页数：12
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