INTERFACIAL REACTIONS OF COBALT THIN-FILMS ON BF2+ ION-IMPLANTED (001) SILICON

被引：26
|
作者：
LUR, W
CHEN, LJ
机构：
来源：
JOURNAL OF APPLIED PHYSICS | 1988年 / 64卷 / 07期
关键词：
D O I：
10.1063/1.341487
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
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页码：3505 / 3511
页数：7
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