PLASMA-POLYMERIZED ALL-DRY RESIST PROCESS FOR 0.25 MU-M PHOTOLITHOGRAPHY

[1] Coopmans F., 1986, Proceedings of the SPIE - The International Society for Optical Engineering, V631, P34, DOI 10.1117/12.963623

[2] Egitto F. D., 1990, PLASMA DEPOSITION TR, P321, DOI 10.1016/B978-0-12-200430-8.50011-7

[3] JOSHI AM, 1993, P SOC PHOTO-OPT INS, V1925, P715

[4] JOUBERT O, 1994, P SOC PHOTO-OPT INS, V2195, P358, DOI 10.1117/12.175352

[5] JOUBERT O, 1993, P SOC PHOTO-OPT INS, V1803, P130, DOI 10.1117/12.142920

[6] PLASMA-ETCHING OF SILYLATED PHOTORESIST - A STUDY OF MECHANISMS [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1993, 11 (01): : 26 - 31

[7] LATULIPE DC, 1994, P SOC PHOTO-OPT INS, V2195, P372, DOI 10.1117/12.175353

[8] RESISTS FOR MICROLITHOGRAPHY - PRESENT STATUS AND RECENT RESEARCH TRENDS [J]. PROGRESS IN POLYMER SCIENCE, 1992, 17 (03) : 319 - 360

[9] NEW PHOTODEFINABLE GLASS ETCH MASKS FOR ENTIRELY DRY PHOTOLITHOGRAPHY - PLASMA DEPOSITED ORGANOSILICON HYDRIDE POLYMERS [J]. APPLIED PHYSICS LETTERS, 1993, 62 (04) : 372 - 374

[1] Coopmans F., 1986, Proceedings of the SPIE - The International Society for Optical Engineering, V631, P34, DOI 10.1117/12.963623

[2] Egitto F. D., 1990, PLASMA DEPOSITION TR, P321, DOI 10.1016/B978-0-12-200430-8.50011-7

[3] JOSHI AM, 1993, P SOC PHOTO-OPT INS, V1925, P715

[4] JOUBERT O, 1994, P SOC PHOTO-OPT INS, V2195, P358, DOI 10.1117/12.175352

[5] JOUBERT O, 1993, P SOC PHOTO-OPT INS, V1803, P130, DOI 10.1117/12.142920

[6] PLASMA-ETCHING OF SILYLATED PHOTORESIST - A STUDY OF MECHANISMS [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1993, 11 (01): : 26 - 31

[7] LATULIPE DC, 1994, P SOC PHOTO-OPT INS, V2195, P372, DOI 10.1117/12.175353

[8] RESISTS FOR MICROLITHOGRAPHY - PRESENT STATUS AND RECENT RESEARCH TRENDS [J]. PROGRESS IN POLYMER SCIENCE, 1992, 17 (03) : 319 - 360

[9] NEW PHOTODEFINABLE GLASS ETCH MASKS FOR ENTIRELY DRY PHOTOLITHOGRAPHY - PLASMA DEPOSITED ORGANOSILICON HYDRIDE POLYMERS [J]. APPLIED PHYSICS LETTERS, 1993, 62 (04) : 372 - 374