INFRARED PROPERTIES OF SILICON MONOX AND EVAPORATED SIO FILMS

被引：13
作者：
HOWARTH, LE
SPITZER, WG
机构：
来源：
JOURNAL OF THE AMERICAN CERAMIC SOCIETY | 1961年 / 44卷 / 01期
关键词：
D O I：
10.1111/j.1151-2916.1961.tb15342.x
中图分类号：
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
引用
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页码：26 / 28
页数：3
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