X-RAY PHOTOELECTRON-SPECTROSCOPY AND X-RAY-ABSORPTION NEAR-EDGE STRUCTURE STUDY OF STRUCTURAL-CHANGE OF PERHYDROPOLYSILAZANE TO SILICON-NITRIDE BY HEAT-TREATMENT

被引：14
作者：
YOKOYAMA, Y
HORIUCHI, K
MAESHIMA, T
OHTA, T
机构：
[1] HIROSHIMA UNIV,FAC SCI,DEPT MAT SCI,HIGASHIHIROSHIMA,HIROSHIMA 724,JAPAN
[2] UNIV TOKYO,GRAD SCH SCI,DEPT CHEM,BUNKYO KU,TOKYO 113,JAPAN
来源：
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1994年 / 33卷 / 6A期
关键词：
PERHYDROPOLYSILAZANE; SILICON NITRIDE; HEAT TREATMENT; XANES; XPS; FT-IR; TPD;
D O I：
10.1143/JJAP.33.3488
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
We studied the structural change of perhydropolysilazane to silicon nitride during the process of heat treatment by means of in situ X-ray absorption near-edge structure (XANES) and X-ray photoelectron spectroscopy (XPS), together with Fourier transformed infra-red (FT-IR) and temperature programmed desorption (TPD) spectroscopies. It was revealed that nucleophilic attack on silicon atoms in the polymer began to proceed above 200 degrees C, by nitrogen atoms in the polymer itself and also in atmospheric ammonia. From 400 degrees C to 600 degrees C, dehydrogenation also occurred and produced dangling bonds which were attacked by ammonia molecules to form the network of Si N-4 tetrahedra. Although oxidation by residual moisture was observed to some extent at 600 degrees C, further heat treatment in ammonia formed Si-N bonds via replacement of oxygen atoms by nitrogen atoms to complete the formation of Si3N4-like structure.
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页码：3488 / 3494
页数：7
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