LASER-INDUCED BREAKDOWN BY IMPACT IONIZATION IN SIO2 WITH PULSE WIDTHS FROM 7 NS TO 150 FS

被引:799
作者
DU, D
LIU, X
KORN, G
SQUIER, J
MOUROU, G
机构
[1] Center for Ultrafast Optical Science, University of Michigan, Ann Arbor
关键词
D O I
10.1063/1.111350
中图分类号
O59 [应用物理学];
学科分类号
摘要
Results of laser-induced breakdown experiments in fused silica (SiO2) employing 150 fs-7 ns, 780 nm laser pulses are reported. The avalanche ionization mechanism is found to dominate over the entire pulse-width range. Fluence breakdown threshold does not follow the scaling of F(th) is similar to square-root tau(p), when pulses are shorter than 10 ps. The impact ionization coefficient of SiO2 is measured up to approximately 3 X 10(8) V/cm. The relative role of photoionization in breakdown for ultrashort pulses is discussed.
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页码:3071 / 3073
页数:3
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